Georgia Institute of Technology Creating Nanoscale Quantum Devices
Image shows patterned etching of graphene oxide flakes to create a logo. The etching achieved a depth of 0.9 nanometers. (Image Credit: GA Tech) E-Beam
September 18, 2020
Image shows patterned etching of graphene oxide flakes to create a logo. The etching achieved a depth of 0.9 nanometers. (Image Credit: GA Tech) E-Beam
